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		<title>ІЧ on Professional IR Heating Lamps</title>
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				<title>Високотемпературне нагрівання для ІЧ обробки пластин</title>
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				<pubDate>Sun, 31 May 2026 04:51:34 +0800</pubDate>
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				<description>&lt;p&gt;&lt;img src=&#34;http://ir-heat-lamp-pro.com/images/a071a4619f1d04d8f3e2839bd3740f1c.png&#34; alt=&#34;Високотемпературне нагрівання для ІЧ обробки пластин&#34;&gt;&lt;/p&gt;&#xA;&lt;p&gt;Out on the fab floor, the lithography cluster keeps moving, no pause button. The track feeds the wafer, the resist spins, the edge bead gets stripped, and the bake has to land inside a tight thermal window—every single pass. A 1°C drift during soft bake or hard bake shifts critical dimension, throws off swing curves, and eats into dose margin. When the bake module can’t hold uniformity across the wafer, you see it fast: footing, scumming, and yield loss that shows up right in the electrical test bins.&#xA;Wafer IR heating isn’t about “warming” the wafer. It’s about delivering repeatable, wafer-level thermal control that fits cleanly into the lithography flow and behaves predictably under production pressure.&lt;/p&gt;</description>
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