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		<title>Halogen on Professional IR Heating Lamps</title>
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			<lastBuildDate>Mon, 01 Jun 2026 02:30:14 +0800</lastBuildDate>
		
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				<title>Halogen IR emitter for wafer drying</title>
				<link>http://ir-heat-lamp-pro.com/en/posts/halogen-ir-emitter-for-wafer-drying/</link>
				<pubDate>Mon, 01 Jun 2026 02:30:14 +0800</pubDate>
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				<description>&lt;p&gt;&lt;img src=&#34;http://ir-heat-lamp-pro.com/images/0ea7296bcdd661f341d1983d454c4037.png&#34; alt=&#34;Halogen IR emitter for wafer drying&#34;&gt;&lt;/p&gt;&#xA;&lt;p&gt;On the 300 mm line, the spin dryer cycles down and the wafer is still wet—water trapped in features, water beading at the edges. Hit it with a conventional hot plate and you risk a slow, uneven ramp that leaves beads behind. Reach for a quick air blow-off and you invite particles. Either way, the next lithography layer is one microcontaminant away from a yield hit.&#xA;Wafer drying is not a “nice to have.” It’s a controlled moisture removal step with a thermal profile that has to be repeatable, clean, and cost-aware. In photoresist processing, leftover moisture throws off both soft bake and hard bake, and you start to drift on critical dimension control and sidewall profile. The heat source has to hit temperature fast, stay uniform across the wafer, and not add contamination.&lt;/p&gt;</description>
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